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Device Innovations Enabled by Advanced Contact Technology
2019-03-15 14:36:05 | 【 【打印】【关闭】

SEMINAR

The State Key Lab of

High Performance Ceramics and Superfine Microstructure Shanghai Institute of Ceramics, Chinese Academy of Sciences

中 国 科 学 院 上 海 硅 酸 盐 研 究 所 高 性 能 陶 瓷 和 超 微 结 构 国 家 重 点 实 验 室

        

Device Innovations Enabled by Advanced Contact Technology

 

Zhen Zhang

Department of Engineering Sciences, the Angstrom laboratory,

Uppsala University, Sweden

 

时间:2019 3 20日(星期三)上午 10:00

地点:嘉定园区F51)会议室 

 

欢迎广大科研人员和研究生参与讨论!

联系人:史迅(69163528 


  报告摘要: 

  The success of the microelectronic and integrated circuit (IC) industry over the past several decades was mainly driven by the steady dimensional scaling of MOSFET transistors. The aggressive size downscaling of the MOSFET device has raised big challenges to their metal-semiconductor contacts.  This talk will start with a short review on the device scaling history and the evolution of the self-aligned contact technology. The emerging demands on the contact technology will be discussed according to the projection of device miniaturization. Then the scaling behavior of different silicide contact materials and a novel self-limiting process to form ultra-thin silicide will be shown, and followed by the silicide/Si interface engineering for the Schottky barrier modification. Finally, example innovations enabled by the advanced contact technology in extremely scaled planar and 3-D CMOS transistors, carbon based devices and low noise transducers will be presented and discussed. 

    

  报告人简介: 

  Prof. Zhen Zhang is currently a professor of electronics at Department of Engineering Sciences, the Angstrom laboratory, Uppsala University, Sweden (assistant professorship with tenure track 201308-201705; associate professorship 201706-201803; full professorship 201804-present), and an adjunct researcher with IBM T. J. Watson Research Center, Yorktown Heights, NY. Before joining Uppsala University in Aug. 2013, he was a postdoctoral research fellow (2008-2010) and a Research Staff Member at IBM T. J. Watson Research Center (2010-2013). Prof. Zhang received his Ph.D degree from the Royal Institute of Technology (KTH), Sweden in 2008. He got the MS degree at Shanghai Institute of Ceramics, Chinese Academy of Sciences in 2003 and the BS degree at University of Science and Technology of China (USTC) in 2000. His current research interest includes advanced nanofabrication technologies, semiconductor nanoelectronics and nanosensors. Prof. Zhang was a recipient of the Chinese Government Award for Outstanding Ph.d Students Abroad in 2006 and a recipient of the Ingvar Clarsson Award from Swedish Strategic Research Foundation in 2013. He also received a G?ran Gustafssons Prize for young researchers and Swedish Research Council (VR) young researcher grant in 2014. He was appointed Wallenberg Academy Fellow (by Knut and Alice Wallenberg Foundation together with the Royal Swedish Academy of Sciences and the Royal Swedish Academy of Engineering Sciences) in 2015 and SSF Future Research Leader (by Swedish Strategic Research Foundation) in 2016. 

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